Prospective wavelengths for projection lithography uing synchrotron radiation
نویسندگان
چکیده
Promising wavelengths for next-generation lithography with a wavelength shorter than 13.5 nm based on synchrotron X-ray source are discussed. Theoretical and experimental values of the reflection coefficients multilayer mirrors providing maximum reflectivity in range 11.4-3.1 presented. The theoretical efficiency optics is compared different wavelengths. Keywords: lithography, optics, mirrors.
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ژورنال
عنوان ژورنال: ?????? ??????????? ??????
سال: 2022
ISSN: ['0044-4642', '1726-748X']
DOI: https://doi.org/10.21883/tp.2022.08.54567.102-22